[C-10-9] Characteristics of Junction Leakage Current of Buried Layer Formed by High Energy Ion Implantation

T. Kuroi、S. Komori、H. Miyatake、K. Tsukamoto、Y. Akasaka (1.LSI R&D Lab. Mitsubishi Electric Corp.)

https://doi.org/10.7567/SSDM.1990.C-10-9