[C-10-9] Characteristics of Junction Leakage Current of Buried Layer Formed by High Energy Ion Implantation

T. Kuroi, S. Komori, H. Miyatake, K. Tsukamoto, Y. Akasaka (1.LSI R&D Lab. Mitsubishi Electric Corp.)

https://doi.org/10.7567/SSDM.1990.C-10-9