[D-8-5] Selective Polysilicon Deposition (SPD) by Hot-Wall LPCVD and Its Application to High Speed Bipolar Devices

T. Aoyama、C. Ogawa、M. Sugiyama、H. Takemura、F. Toyokawa、M. Sakamoto、T. Tashiro (1.VLSI Development Division, NEC Corporation)

https://doi.org/10.7567/SSDM.1990.D-8-5