[D-8-5] Selective Polysilicon Deposition (SPD) by Hot-Wall LPCVD and Its Application to High Speed Bipolar Devices

T. Aoyama, C. Ogawa, M. Sugiyama, H. Takemura, F. Toyokawa, M. Sakamoto, T. Tashiro (1.VLSI Development Division, NEC Corporation)

https://doi.org/10.7567/SSDM.1990.D-8-5