[LN-SE-3] Fabrication of a-Si:H TFT's by a Large Area Ion Doping Technique

Akihisa YOSHIDA, Masaaki NUKAYAMA, Yasunori ANDOH, Masatoshi KITAGAWA, Takashi HIRAO (1.Central Resarch Laboratories, Matsushita Erectric Ind. co., Ltd., 2.Research and Development Div., Nissin Electric Co., Ltd.)

https://doi.org/10.7567/SSDM.1990.LN-SE-3