[S-CII-5] A New Stacked Capacitor Structure Using Hemispherical-Grain(HSG) Poly-Silicon Electrodes

H. Watanabe、N. Aoto、S. Adachi、T. Ishijima、E. Ikawa、K. Terada (1.Microelectronics Research Laboratories, NEC Corporation)

https://doi.org/10.7567/SSDM.1990.S-CII-5