[S-E-10] Low Temperature Polysilicon TFTs by Non-Mass-Separated Ion Flux Doping Technique

Kunio MASUMO, Masaya KUNIGITA, Satoshi TAKAFUJI, Nobuhiro NAKAMURA, Atsushi IWASAKI, Masanori YUKI (1.Research Center, Asahi Glass Co., Ltd.)

https://doi.org/10.7567/SSDM.1990.S-E-10