[S-E-10] Low Temperature Polysilicon TFTs by Non-Mass-Separated Ion Flux Doping Technique

Kunio MASUMO、Masaya KUNIGITA、Satoshi TAKAFUJI、Nobuhiro NAKAMURA、Atsushi IWASAKI、Masanori YUKI (1.Research Center, Asahi Glass Co., Ltd.)

https://doi.org/10.7567/SSDM.1990.S-E-10