[S-E-21] Short-Channel Inverted Staggered a-Si:H Thin Film Transistors Fabricated by Electron-Beam Lithography

G. FORTUNATO、M. GENTILI、L. LUCIANI、L. MARIUCCI、G. PETROCCO、C. REITA (1.Istituto di Elettronica dello Stato Solido, CNR)

https://doi.org/10.7567/SSDM.1990.S-E-21