The Japan Society of Applied Physics

[S-E-21] Short-Channel Inverted Staggered a-Si:H Thin Film Transistors Fabricated by Electron-Beam Lithography

G. FORTUNATO, M. GENTILI, L. LUCIANI, L. MARIUCCI, G. PETROCCO, C. REITA (1.Istituto di Elettronica dello Stato Solido, CNR)

https://doi.org/10.7567/SSDM.1990.S-E-21