The Japan Society of Applied Physics

[A-2-5] Strain Evaluation at the Si/SiO2 Interface Using ER Method

Pornchai YONGWATTANASOONTORN、Hitoshi KUBO、Masato MORIFUJI、Kenji TANIGUCHI、Chihiro HAMAGUCHI Keitaro IMAI (1.Department of Electronic Engineering, Osaka University、2.ULSI Research center, Toshiba Corporation)

https://doi.org/10.7567/SSDM.1991.A-2-5