[A-3-1] In-Situ Observation of Electromigration in Cu Film with Scanning μ-RHEED Microscope

Kazuya Masu, Yohei Hiura, Kazuo Tsubouchi, Tadahiro Ohmi, Nobuo Mikoshiba (1.Research Institute of Electrical Communication, Tohoku University, 2.Department of Electronics, Faculty of Engineering, Tohoku University)

https://doi.org/10.7567/SSDM.1991.A-3-1