[A-3-2] Sputtering of Aluminum Film Using Microwave Plasma with High Magnetic Field

S. Takehiro, N. Yamanaka, A. Narai, H. Shindo, S. Shingubara, Y. Horiike (1.Department of Electrical Engineering, Hiroshima University)

https://doi.org/10.7567/SSDM.1991.A-3-2