[A-3-2] Sputtering of Aluminum Film Using Microwave Plasma with High Magnetic Field

S. Takehiro、N. Yamanaka、A. Narai、H. Shindo、S. Shingubara、Y. Horiike (1.Department of Electrical Engineering, Hiroshima University)

https://doi.org/10.7567/SSDM.1991.A-3-2