[A-3-3] Deposition of Polycrystalline Silicon by Rapid Thermal CVD and Its Application to Direct Contact to TiSi2

T. Yamaguchi、H. Itoh、T. Katayama、K. Tsukamoto、Y. Akasaka (1.LSI Laboratory, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1991.A-3-3