[A-3-3] Deposition of Polycrystalline Silicon by Rapid Thermal CVD and Its Application to Direct Contact to TiSi2

T. Yamaguchi, H. Itoh, T. Katayama, K. Tsukamoto, Y. Akasaka (1.LSI Laboratory, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1991.A-3-3