[A-4-2] Selective Epitaxial Growth of Silicon and Germanium at Low Temperatures Using Ultraclean CVD Processing

Junichi MUROTA、Manabu KATO、Nobuo MIKOSHIBA、Shoichi ONO (1.Research Institute of Electrical Communication, Tohoku University)

https://doi.org/10.7567/SSDM.1991.A-4-2