[A-4-2] Selective Epitaxial Growth of Silicon and Germanium at Low Temperatures Using Ultraclean CVD Processing

Junichi MUROTA, Manabu KATO, Nobuo MIKOSHIBA, Shoichi ONO (1.Research Institute of Electrical Communication, Tohoku University)

https://doi.org/10.7567/SSDM.1991.A-4-2