The Japan Society of Applied Physics

[B-1-1] Low-Temperature Silicon Epitaxy without Substrate Heating and Selectivity Inversion in Ultraclean ECR Plasma Enhanced CVD

Takashi MATSUURA、Junichi MUROTA、Tadahiro OHMI、Shoichi ONO (1.Department of Electronics, Faculty of Engineering, Tohoku University、2.Research Institute of Electrical Communication, Tohoku University)

https://doi.org/10.7567/SSDM.1991.B-1-1