[B-2-4] The Effects of Hot Ion-Implantation on the Electrical Properties of Amorphous-Silicon Films Produced by CVD Method

Tsutomu SATOH、Hiroshi KANOH、Osamu SUGIURA、Masakiyo MATSUMURA (1.Department of Physical Electronics, Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.1991.B-2-4