[PB2-1] BF2+ Ion Implantation into Very Low Temperature Si Wafer

M. Takakura, T. Kinoshita, T. Uranishi, S. Miyazaki, M. Koyanagi, M. Hirose (1.Department of Electrical Engineering, Hiroshima University, 2.Research Center for Integrated Systems, Hiroshima University)

https://doi.org/10.7567/SSDM.1991.PB2-1