[PB4-4] Novel Epitaxial Growth Technology of Si1-xGex Films by in situ Rapid Thermal Chemical Vapor Deposition

Kinya ASHIKAGA、Hisashi FUKUDA、Seigo OHNO (1.Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.)

https://doi.org/10.7567/SSDM.1991.PB4-4