[PB7-5] Elimination of Metal-Sputtering Contamination in Ion Implanter for Low-Leakage-Current pn Junction Formation

Y. Kato、S. Shimonishi、T. Ohmi、T. Shibata、T. Nitta (1.Department of Electronics, Tohoku University、2.Device Development Center, Hitachi Ltd.)

https://doi.org/10.7567/SSDM.1991.PB7-5