Effect of Silicon Wafer In-Situ Cleaning on the Structure of Ultrathin Silicon Oxide Films

Naozumi TERADA; Hiroki OGAWA; Kazunori MORIKI; Akinobu TERAMOTO; Koji MAKIHARA; Mizuho MORITA; Tadahiro OHMI; Takeo HATTORI

doi:https://doi.org/10.7567/SSDM.1991.PB7-7

[PB7-7] Effect of Silicon Wafer In-Situ Cleaning on the Structure of Ultrathin Silicon Oxide Films

Naozumi TERADA、Hiroki OGAWA、Kazunori MORIKI、Akinobu TERAMOTO、Koji MAKIHARA、Mizuho MORITA、Tadahiro OHMI、Takeo HATTORI (1.Department of Electrical and Electronic Engineering, Musashi Institute of Technology、2.Department of Electronics, Tohoku University)

https://doi.org/10.7567/SSDM.1991.PB7-7

1991 International Conference on Solid State Devices and Materials

[PB7-7] Effect of Silicon Wafer In-Situ Cleaning on the Structure of Ultrathin Silicon Oxide Films