Infrared Characterization of SiO2 Ultra Thin Film by Grazing Internal Reflection

Masanori OKUYAMA; Yuichi MATSUI; Yasuo MIYAGAWA; Yoshihiro HAMAKAWA

doi:https://doi.org/10.7567/SSDM.1991.PB7-8

1991 International Conference on Solid State Devices and Materials

1991年8月27日〜 1991年8月29日
Pacifico Yokohama, Yokohama, Japan

[PB7-8] Infrared Characterization of SiO2 Ultra Thin Film by Grazing Internal Reflection

Masanori OKUYAMA、Yuichi MATSUI、Yasuo MIYAGAWA、Yoshihiro HAMAKAWA (1.Department of Electrical Engineering, Faculty of Engineering Science, Osaka University)

https://doi.org/10.7567/SSDM.1991.PB7-8

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