[PC5-5] TFT and Physical Properties of Poly-Crystalline Silicon Prepared by Very Low Pressure Chemical Vapour Deposition (VLPCVD)

Mitsutoshi MIYASAKA、Takashi NAKAZAWA、Ichio YUDASAKA、Hiroyuki OHSHIMA (1.SEIKO EPSON CORPORATION TFT Research Laboratory)

https://doi.org/10.7567/SSDM.1991.PC5-5