[PC5-8] Enlargement of P-Si Film Grain Size by Excimer Laser Annealing and Its Application to High-Performance P-Si TFT

S. Noguchi、H. Kuriyama、S. Kiyama、T. Kuwahara、T. Nohda、S. Ishida、K. Sano、H. Iwata、S. Tsuda、S. Nakano (1.Giant Electronics Technology Co., Ltd.、2.SANYO Electric Co., Ltd.)

https://doi.org/10.7567/SSDM.1991.PC5-8