[PC5-8] Enlargement of P-Si Film Grain Size by Excimer Laser Annealing and Its Application to High-Performance P-Si TFT

S. Noguchi, H. Kuriyama, S. Kiyama, T. Kuwahara, T. Nohda, S. Ishida, K. Sano, H. Iwata, S. Tsuda, S. Nakano (1.Giant Electronics Technology Co., Ltd., 2.SANYO Electric Co., Ltd.)

https://doi.org/10.7567/SSDM.1991.PC5-8