[PC5-L18] Structural Investigations of Polycrystalline Silicon Films Prepared by Plasma Enhanced CVD

Yoshiro AKAGI, Yoshinobu NAKAMURA, Yasunari OKAMOTO, Tatsuo MORITA, Yoshimi KOJIMA, Masahiro FUJIWARA, Shuhei TSUCHIMOTO, Masayoshi KOBA (1.SHARP Corporation Corporate Research and Development Group)

https://doi.org/10.7567/SSDM.1991.PC5-L18