[PC5-L18] Structural Investigations of Polycrystalline Silicon Films Prepared by Plasma Enhanced CVD

Yoshiro AKAGI、Yoshinobu NAKAMURA、Yasunari OKAMOTO、Tatsuo MORITA、Yoshimi KOJIMA、Masahiro FUJIWARA、Shuhei TSUCHIMOTO、Masayoshi KOBA (1.SHARP Corporation Corporate Research and Development Group)

https://doi.org/10.7567/SSDM.1991.PC5-L18