[S-B-3] Chemical Stability of HF-Treated Si(111) Surfaces

T. Yasaka、K. Kanda、K. Sawara、S. Miyazaki、M. Hirose (1.Department of Electrical Engineering, Hiroshima University、2.Research Center for Integrated Systems, Hiroshima University)

https://doi.org/10.7567/SSDM.1991.S-B-3