The Japan Society of Applied Physics

[S-C-6] Epitaxy and Pattern Formation of III- V Semiconductors as a Through UHV Processing towards 2- and 3-Dimensional Nanostructures

Y. KATAYAMA, K. AKITA, Y. OHKI, Y. SUGIMOTO, Y. HIRATANI, H. KAWANISHI (1.Optoelectronics Technology Research Laboratory (OTL))

https://doi.org/10.7567/SSDM.1991.S-C-6