[S-C-6] Epitaxy and Pattern Formation of III- V Semiconductors as a Through UHV Processing towards 2- and 3-Dimensional Nanostructures

Y. KATAYAMA、K. AKITA、Y. OHKI、Y. SUGIMOTO、Y. HIRATANI、H. KAWANISHI (1.Optoelectronics Technology Research Laboratory (OTL))

https://doi.org/10.7567/SSDM.1991.S-C-6