Plasma Enhanced Liquid Source-CVD and Rapid Thermal Annealing of Tantalum Penta Oxide Dielectric Material

P. A. Murawala; M. Sawai; T. Tatsuta; O. Tsuji Sz. Fujita; Sg. Fujita

doi:https://doi.org/10.7567/SSDM.1992.A-4-3

[A-4-3] Plasma Enhanced Liquid Source-CVD and Rapid Thermal Annealing of Tantalum Penta Oxide Dielectric Material

P. A. Murawala, M. Sawai, T. Tatsuta, O. Tsuji Sz. Fujita, Sg. Fujita (1.Research & Development Center, Samco International Incorporated, 2.Department of Electrical Engineering, Kyoto University)

https://doi.org/10.7567/SSDM.1992.A-4-3

1992 International Conference on Solid State Devices and Materials

[A-4-3] Plasma Enhanced Liquid Source-CVD and Rapid Thermal Annealing of Tantalum Penta Oxide Dielectric Material