[A-4-5] Nitride Masked Polishing (NMP) Technique for Surface Planarization of Interlayer-Dielectric Films

Yoshihiro Hayashi、Toshio Watanabe、Shuji Takahashi (1.ULSI Res. Lab., Microelectronics Res. Labs., NEC Corporation)

https://doi.org/10.7567/SSDM.1992.A-4-5