[A-4-5] Nitride Masked Polishing (NMP) Technique for Surface Planarization of Interlayer-Dielectric Films
Yoshihiro Hayashi, Toshio Watanabe, Shuji Takahashi
(1.ULSI Res. Lab., Microelectronics Res. Labs., NEC Corporation)
https://doi.org/10.7567/SSDM.1992.A-4-5