[B-1-4] A Fabrication of Homogenious Poly-Si TFT's Using Excimer Laser Annealing

I. Asai、N. Kato、M. Fuse、T. Hamano (1.Electronic Imaging and Devices Research Laboratory, Fuji Xerox Co., Ltd.)

https://doi.org/10.7567/SSDM.1992.B-1-4