A Novel Fabrication Method for Poly-Si TFTs with a Self-Aligned LDD Structure

K. Kobayashi; H. Murai; T. Sakamoto; H. Tokioka; T. Sugawara; Y. Masutani; H. Namizaki; M. Nunoshita

doi:https://doi.org/10.7567/SSDM.1992.LD-3

1992 International Conference on Solid State Devices and Materials

1992年8月26日〜 1992年8月28日
Tsukuba Center Building, Tsukuba, Japan

[LD-3] A Novel Fabrication Method for Poly-Si TFTs with a Self-Aligned LDD Structure

K. Kobayashi、H. Murai、T. Sakamoto、H. Tokioka、T. Sugawara、Y. Masutani、H. Namizaki、M. Nunoshita (1.Materials and Electronic Devices Lab., Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1992.LD-3

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