A Novel Fabrication Method for Poly-Si TFTs with a Self-Aligned LDD Structure

K. Kobayashi; H. Murai; T. Sakamoto; H. Tokioka; T. Sugawara; Y. Masutani; H. Namizaki; M. Nunoshita

doi:https://doi.org/10.7567/SSDM.1992.LD-3

1992 International Conference on Solid State Devices and Materials

Aug 26, 1992 - Aug 28, 1992
Tsukuba Center Building, Tsukuba, Japan

[LD-3] A Novel Fabrication Method for Poly-Si TFTs with a Self-Aligned LDD Structure

K. Kobayashi, H. Murai, T. Sakamoto, H. Tokioka, T. Sugawara, Y. Masutani, H. Namizaki, M. Nunoshita (1.Materials and Electronic Devices Lab., Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1992.LD-3

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