[LD-5] Ultrathin Ta2O5 Films on Rapid Thermal Nitrided Rugged Polysilicon for High Density DRAMs

P. C. Fazan、V. K. Mathews、R. L. Maddox、A. Ditali、N. Sandler、D. L. Kwong (1.Micron Semiconductor, Inc.、2.LAM Research Corporation、3.Microelectronics Research Center, University of Texas)

https://doi.org/10.7567/SSDM.1992.LD-5