[PA2-2] A High Speed, Low Power P-Channel Flash EEPROM Using Silicon Rich Oxide as Tunneling Dielectric

C. C. -H. Hsu, A. Acovic, L. Dori, B. Wu, T. Lii, D. Quinlan, D. DiMaria, Y. Taur, M. Wordeman, T. Ning (1.IBM Research Division, Thomas J. Watson Research Center, 2.Department of Electrical Engineering, National Tsing-Hua Univ.)

https://doi.org/10.7567/SSDM.1992.PA2-2