[PA2-L10] Impact of Low-Energy Ion-Implantation on Deep-Submicron Phosphorus-LDD nMOSFETs

Tetsuo Izawa、Koh Watanabe、Seiichiro Kawamura (1.Electron Device Group, FUJITSU LIMITED)

https://doi.org/10.7567/SSDM.1992.PA2-L10