[PA2-L9] Subthreshold Slope in Ultra Thin-Film SOI MOSFET's and Its Two-Dimensional Analytical Modeling down to 0.1μm Gate Length

H. O. Joachim, Y. Yamaguchi, K. Ishikawa, T. Nishimura, K. Tsukamoto (1.Mitsubishi Electric Corporation, LSI Laboratory)

https://doi.org/10.7567/SSDM.1992.PA2-L9