[PD2-10] The Impact of Titanium Silicide on the Contact Resistance for Shallow Junction Formed by Out-Diffusion of Arsenic from Polysilicon

Wen Luh Yang、Tan Fu Lei、Jeng Tong Hwang、Chung Len Lee (1.Institute of Electronics, National Chiao Tung University)

https://doi.org/10.7567/SSDM.1992.PD2-10