[PD3-2] Novel Single-Step Oxynitridation (SS-RTON) Technology for Forming Highly Reliable EEPROM Tunnel Oxide Films
Hisashi FUKUDA、Makoto YASUDA、Toshiyuki IWABUCHI
(1.Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.)
https://doi.org/10.7567/SSDM.1992.PD3-2
