Novel Single-Step Oxynitridation (SS-RTON) Technology for Forming Highly Reliable EEPROM Tunnel Oxide Films

1992 International Conference on Solid State Devices and Materials

Aug 26, 1992 - Aug 28, 1992
Tsukuba Center Building, Tsukuba, Japan

Hisashi FUKUDA, Makoto YASUDA, Toshiyuki IWABUCHI (1.Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.)