[S-II-3] Critical Thickness of Heteroepitaxial Si1-xGex/Si Layers as Studied by Atomic Force Microscopy

Toshiyuki NAKAMURA、Morifumi OHNO、Kinya ASHIKAGA、Seigo OHNO (1.Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.)

https://doi.org/10.7567/SSDM.1992.S-II-3