[A-1-3] High-Performance Buried-Gate MOSFETs with RTO-Grown Ultrathin Gate Oxide Films

Hisashi FUKUDA、Tomiyuki ARAKAWA、Toshiyuki OCHIAI Takahisa HAYASHI、Toshiyuki IWABUCHI (1.Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.)

https://doi.org/10.7567/SSDM.1993.A-1-3