[A-2-6] Universal Behavior of Hot-Carrier Degradation in LDD NMOSFET's

J. S. Goo, H. Shin, H. Hwang, D. G. Kang, D. H. Ju (1.Research and Development Laboratory, GoldStar Electron Company, Ltd.)

https://doi.org/10.7567/SSDM.1993.A-2-6