[A-3-3] Plasma Damage of Gate Oxide through the Interlayer Dielectric

Shuji Hirao、Tatsuo Sugiyama、Takehito Yoshida、Kousaku Yano、Noboru Nomura (1.Semiconductor Research Center Matsushita Electric Industrial Co., Ltd.)

https://doi.org/10.7567/SSDM.1993.A-3-3